ASML Booth at 8th CIIE in Shanghai

ASML Booth at 8th CIIE in Shanghai

SHANGHAI, CHINA - NOVEMBER 6, 2025 - The audience learned about panoramic lithography solutions at the ASML booth at the 8th CIIE in Shanghai, China on November 6th, 2025.

  • Product Code
  • ILEA004878435
  • Registered date
  • 2025/11/06 00:00:00
  • Credit
  • CFOTO / Kyodo News Images
  • Media source
  • CFOTO
  • Media size
  • 5760 × 3840 pixel
  • Resolution
  • 350 dpi
  • Deployment size
  • 8.71(MB)*
  • Special instruction
  • CHINA OUT
    **The text may be generated by an automatic translation system**

*File size when opened in Photoshop, etc.

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