Young Japanese woman pursues career as world-class hat designer
Photo taken March 2, 2016 at Osaka University's Toyonaka Campus shows Sakiko Fujiwara, who aims to become a world-class hat designer, after winning one of the world's most prestigious hat design contests in 2015. (Kyodo)
==Kyodo
- Product Code
- ILEA000051165
- Registered date
- 2016/6/03 11:41:18
- Credit
- Kyodo / Kyodo News Images
- Media size
- 1288 × 1712 pixel
- Deployment size
- 405.73(KB)*
*File size when opened in Photoshop, etc.