Atmospheric pressure plasma system for Kai Semiconductor

Atmospheric pressure plasma system for Kai Semiconductor

Kai Semiconductor (Shimogyo-ku,Kyoto City) will release on December 2 an atmospheric pressure plasma system "GaCo (get a command of)," which enables plasma processing of curved surfaces, which has been difficult to do at atmospheric pressure. By placing it on the object to be processed and tracing it, even curved shapes can be processed efficiently. The dielectric barrier discharge, which discharges at a low temperature, does not burden or affect the object. The standard model, the 200, processes 100 millimeters per second with a processing width of 200 millimeters and a maximum width of 1,100 millimeters. Plasma treatment is promising for use in pre-treatment to improve adhesion in the tempered glass coating process. In the case of curved surface treatment, vacuum plasma treatment is inefficient due to batch processing, and solvent treatment requires large equipment. Photo taken on November 20, 2019, credit: Nikkan Kogyo Shimbun / Kyodo News Images

  • Product Code
  • ILEA000687924
  • Registered date
  • 2019/11/20 00:00:00
  • Credit
  • THE NIKKAN KOGYO SHIMBUN / Kyodo News Images
  • Media source
  • THE NIKKAN KOGYO SHIMBUN
  • Media size
  • 4000 × 3000 pixel
  • Resolution
  • 180 dpi
  • Deployment size
  • 4.71(MB)*
  • Special instruction
  • **The text may be generated by an automatic translation system**

*File size when opened in Photoshop, etc.

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